Calibration of an Ion Enhanced Chemical Etching model

vwfex14 : Calibration of an Ion Enhanced Chemical Etching model

Requires: VWF, VICTORY PROCESS

This example demonstrates an automated calibration of the VICTORY PROCESS Ion Enhanced Chemical Etching (IECE) model by means of a scripted optimization run. The parameters calibrated are neutron rate and ratio. An additional parameter mask width is defined in the deck to allow using measurements for several mask widths in the calibration task.

To carry out the calibration the Levenberg-Marquardt algorithm is used together with a target script, which computes the deviation of simulation results from measurements (error vector). The trench depth obtained experimentally for 5 different mask widths for 5 different set-ups of the IECE process is used to define the target for calibration. Mask widths as well as targeted trenchdepths are entered in the worksheet pane. Simulations for all 5 mask widths are carried out per optimizer iteration step (each combination of neutron rate and ratio). After each such step the target script is called to compute the error vector out of measured and computed trenchdepth values.

To open and run this example, select the Help Load example button in the VWF explorer. This will import all examples into your database. Once imported, the examples will be available under the directory called examples.