VT Optimization Using a DOE Approach

vwfex02 : VT Optimization Using a DOE Approach

Requires: VWF, ATHENA, ATLAS

The objective is to optimize 4 process parameters (gate oxide time, temperature, Vt adjust implant dose, and energy) in order to get a targetted Vt of 0.65V. In this experiment we defined a Box-benken DOE in order to generate a quadratic model of Vt as a function of the 4 process variables in SPAYN and then perform a synthesis analysis in TonyPlot by setting Vt to 0.65V. Comparison with a direct optimization approach can be made (see vwfex03.in).

Thanks to the RSM, Yield and failure were also performed.

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