Dose Dependent Channeling of Phosphorus : Dose Dependent Channeling of Phosphorus

Requires: SSuprem 4
Minimum Versions: Athena 5.21.2.R

This example shows the dose dependence of zero-tilt P implant profiles obtained using the SIMS Verified Dual Pearson ( SVDP ) method and compares them with experimental results (R.J. Shreutelkamp,, Nucl.Instr. & Meth., B55, p.615, 1991) saved in *.exp files. As the implant dose increases, more damage is caused resulting in additional dechanneling of phosphorus ions. Therefore, the profile tail shortens with increasing dose.

To load and run this example, select the Load example button. This action will copy all associated files to your current working directory. Select the DeckBuild run button to execute the example.