A Simple Approach

anelex03.in : A Simple Approach

Requires: Elite
Minimum Versions: Athena 5.21.2.R

Simple directional etching can be modeled by combining two etch rate components: isotropic and directional. By selecting positive or negative values for the isotropic component, you can model trench etch with undercuts or conical sections such as demonstrated in this example.

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.