Two-Step Trench Etch Process

anelex11.in : Two-Step Trench Etch Process

Requires: Elite
Minimum Versions: Athena 5.21.2.R

This example simulates trench etching. Etching is described by a combination of wet etching (30nm/min) and ion induced etching (100nm/min).

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.