Boron Implant and Anneal

andfex01.in : Boron Implant and Anneal

Requires: SSuprem 4
Minimum Versions: Athena 5.21.2.R

This example gives a simple demonstration of implantation and annealing. Boron is implanted and the profile diffused. Because the implant is not masked, Athena/SSuprem 4 remains in 1D mode.

For this anneal of a medium dose implant in an inert ambient the default fermi diffusion model is used.

After completing the diffusion calculation, TonyPlot is used to plot a 1D cutline through the structure.

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.