Geometric etching models in 2D

vp2dex01.in : Geometric etching models in 2D


Requires: Victory Process
Minimum Version: Victory Process 7.22.3.R

This example demonstrates different geometric etching models provided by Victory Process. The example is set up with a simplistic structure consisting of a silicon surface with a window of polysilicon etched out and a conformal layer of nitride deposited in it.

This layer is etched using different etching models namely min, max, dry, wet and lastdepo.

Min model etches the structure down to a depth (thickness) as measured from the lowest plane of the material (selective etching) or the lowest plane of the structure (non-selective etching).

Similarly, max model etches the structure down to a depth (thickness) measured from the highest point/plane of the material ( selective etching) or the lowest plane of the structure (non-selective etching).

Dry and wet etch models enable anisotropic etching and isotropic etching respectively.

Lastly, lastdepo model removes the last deposited layer. The example deposits a thin conformal layer of aluminum and uses lastdepo to remove it, leaving the nitride layer untouched.

This example can be used as a template for using different etching models depending on the requirement.

The example plots the produced structures using Tonyplot.

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.