Photolithography example

vpex10.in : Photolithography example

Requires: Victory Process : Core Simulator
Minimum Versions: Victory Process 7.22.0.R

This example demonstrates photolithography through a user defined mask.

List of key syntax:

Init: Defines simulation domain, geometrical mesh resolution and number of Adaptive Mesh Refinement (AMR) levels

Lithography: Photolithography for a predefined mask. mask names the layer to which the photolithography step to be applied. maskAperture defines the numerical aperture of the optical system. standardWl sets the wavelength to one of predefined values. resultImage nominates the file where the areal image is stored.

Deposit: Deposition with geometrical mode

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.