Resist Flow Model for Post-development Bake

anopex20.in : Resist Flow Model for Post-development Bake

Requires: SSuprem 4/Optolith
Minimum Versions: Athena 5.22.3.R

This example shows planar lithography. The photoresist is baked following development to show the flow that takes place.

The plot shows the resist before and after the bake.

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.