Aerial Image Simulation : Aerial Image Simulation

Requires: SSuprem 4/Optolith
Minimum Versions: Athena 5.22.3.R

This example demonstrates the first step in lithography simulation. A simple mask has been used: two elbows and a contact hole (cd=1 um). The stepper description corresponds to: Canon FRA-1550, g-line , NA=0.43, sigma=0.5.

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.