• TCAD Examples

vpex04.in : Physical deposition models example

Requires: Victory Process : Core Simulator, 3D Physical Etch & Deposit
Minimum Versions: Victory Process 7.22.0.R

This example demonstrates three different default deposition models as well as geometrical deposition. This example also illustrates the definition of mask polygons in Victory Process.

The example shows a deposition steps performed with three different models on the same initial structure. Conformal, non-conformal and primary deposition model are used. The last illustrates a deposition model that uses the primary flux ballistic transport mode.

List of key syntax:

Init: Defines simulation volume and meshing resolution and number of Adaptive Mesh Refinement (AMR) levels

SpecifyMaskPoly: Defines mask layer polygon

Deposit: Simple analytical deposition

Deposit: Physical deposition process. Parameters include model, to select the deposition model, material, to define the deposited material, deposition rate, to define the deposition rate in um/sec, um/min or um/hour with um/min being the default, time to define the deposition time in sec, min, hour with min being the default and ratio to define the extend of directionality of the deposition.

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.

Additional Info:

Input Files
Output Results
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