Grain-based Polysilicon Diffusion Model

andfex08.in : Grain-based Polysilicon Diffusion Model

Requires: SSuprem 4
Minimum Versions: Athena 5.22.3.R

This example demonstrates the diffusion of impurities in polysilicon in both grain and grain boundary components. A comparison is run between the default diffusion model and the grain-based model.

The grain based model is enabled by the syntax: method poly.diff

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.