• TCAD Examples

latchex01.in : Transient Simulation of CMOS Latch-Up

Requires: MaskViews/SSuprem 4/S-Pisces
Minimum Versions: Athena 5.22.3.R, Atlas 5.28.1.R

This example demonstrates a latch-up transient in an npnp structure typical of CMOS processes. The stages of this examples are:

  • Definition of a CMOS layout to include a parasitic npnp structure
  • Interface of the layout information to Athena
  • Process simulation of the npnp structure
  • Interface of the structure to Atlas with automatic electrode specification
  • Setting of a transient negative voltage pulse on the Vss contact to trigger latch-up.

The process simulation for this example is defined using MASKVIEWS. Users not familiar with the MASKVIEWS/Athena interface should read the description under the ATHENA_SSUPREM4 examples section. Along with the input file that can be seen by loading this example in to DeckBuild is a layout file. The layout is of a CMOS well boundary with n+ and p+ contact layers. An n-p-n-p structure is formed by these layers. By modifying the layers it is possible to misalign the contacts with respect to the well boundary and repeat this latch-up simulation. Using the MASKVIEWS/Athena interface avoids having to set etch coordinates manually.

Along with the layout file, a MASKVIEWS cross-section file is copied to the user's current working directory when 'Load' is selected. For this example, the cross-section information is indicated on the go athena line at the top of the input file. This is a cross section drawn by the user through the layout. In this layout it is drawn through the center of the n+ and p+ contacts.

The key syntax in Athena that load the mask edge coordinates are mask statements. A syntax sequence such as:

deposit alum thickness=0.05 div=2
mask name="MET"
etch alum dry thickness=0.06

will deposit a metal layer, deposit photoresist, load the etch coordinates of the layer defined in the cross section file as 'MET', etch the photoresist pattern, etch the exposed metal with the specified thickness, and then finally strip off all photoresist.

In the layout file, each area of metal (layer MET) was defined with a name to be used as the name of the electrode associated with that area of metal. Each of the n+ and p+ contacts were defined in this manner. The statement autoelectrode at the end of the Athena run will automatically define the electrodes for Atlas.

In Atlas the material and model parameters are set first as usual. Carrier lifetimes are set in the material statement. These lifetimes will affect the gain of the parasitic bipolar devices in this structure. Typical bipolar models are set. Here all models are listed individually, but they could be replaced by the macro models bip. For latch-up, impact ionization must also be included. Two DC solve statements are required to bias the device into the correct initial voltage with 5V reverse bias between nwell and pwell.

Latch-up in this example will be caused by a transient pulse on the Vss contact. This is defined by two solve statements. The first defines the ramp to the negative voltage and the time at that voltage. The second sets the time for the ramp down and the final simulation time. If no latch-up occurs, the device should return at the end of this transient to the same state as at the beginning of the transient.

Latch-up is seen in the terminal characteristics as the current rises during the negative pulse, begins to fall, but in the end keeps rising. At the final simulation point the current is still rising and eventually burn-out of the device would occur. The time taken for this to occur could also be simulated by including lattice heating (using GIGA) into this simulation.

Latch-up can also be seen in the internal distributions of carriers and current density in the solution files generated by this example.

To load and run this example, select the Load button in DeckBuild. This will copy the input file and any support files to your current working directory. You cannot run this file until the cross-section file is loaded. To do this go to the DeckBuild menu Tools->MaskViews->Cutlines Then select the name of the cross-section file from the list. The name will be <file>.sec where <file> is the name of this example. Then press Load on this Cutline menu. Once the cross-section file is loaded, select Run in DeckBuild to execute the example

Additional Info:

Input Files
Output Results
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