Planar Lithography with Phase Shift Masks : Planar Lithography with Phase Shift Masks

Requires: SSuprem 4/Optolith
Minimum Versions: Athena 5.21.2.R

This example shows lithography with phase shift masks. The aerial image is calculated for a 0.3 um contact hole and a 0.3 contact hole with sub-imageable (0.1 um) 180 degree phase shift outriggers. The use of phase-shifters results in twice double intensity in the center of the whole (see the first TonyPlot). Consequently, only the use of phase-shifting technique allows to achieve desirable CD, while the sample without phase-shifters remains underdeveloped.

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.