Planar Lithography with Phase Shift Masks : Planar Lithography with Phase Shift Masks

Requires: SSuprem 4/Optolith
Minimum Versions: Athena 5.21.2.R

This example shows lithography with phase shift masks. The aerial image is calculated for a 0.3 um contact hole and a 0.3 contact hole with sub-imageable (0.1 um) 180 degree phase shift outriggers. The use of phase-shifters results in twice double intensity in the center of the whole (see the first TonyPlot). Consequently, only the use of phase-shifting technique allows to achieve desirable CD, while the sample without phase-shifters remains underdeveloped.

To load and run this example, select the Load example button. This action will copy all associated files to your current working directory. Select the DeckBuild run button to execute the example.