Aerial Image Simulation : Aerial Image Simulation

Requires: SSuprem 4/Optolith
Minimum Versions: Athena 5.21.2.R

This example demonstrates the first step in lithography simulation. A simple mask has been used: two elbows and a contact hole (cd=1 um). The stepper description corresponds to: Canon FRA-1550, g-line , NA=0.43, sigma=0.5.

To load and run this example, select the Load example button. This action will copy all associated files to your current working directory. Select the DeckBuild run button to execute the example.