Poly Emiter Bipolar Device Structure (PNP)

amex02.in : Poly Emiter Bipolar Device Structure (PNP)

Requires: SSuprem 4/Elite
Minimum Versions: Athena 5.21.2.R

This example shows the fabrication of a PNP Bipolar device structure using Elite and SSuprem 4 to model etching and oxidation processes. In this example, the ADAPTIVE MESHING is turned on using the command method adapt . The grid should be adapted during ion implantation and anneal process. The initial grid setting is still using that designed by hand. However, the first time use of the grid adaptation feature grid.model allow the grid parameters to be optimized according to its application area, e.g. PNP Bipolar device. and stored in the template PNP . At this moment, the template PNP only contains one line:

adapt.par disable oxide

adapt.par disable poly

This means do not use an adaptive grid in oxide and poly since the grid inside oxide and poly is not important for PNP Bipolar devices.

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.