Contents:

• Introduction
• Capabilities of OPTOLITH
  • Aerial image in-focus case
  • Aerial image out-focus case
• Applications of OPTOLITH
• PAC concentration before post-bake
• PAC concentration after post-bake
• Developed resist profile
• CD control using OPTOLITH
  • SEM array
• Smile plot for 0.5 micron line
• ED-tree
• CD control using OPTOLITH and VWF
• Regression model:
  • Smile plot
  • ED tree plot
  • Smile plot for resist thickness = 1.1 micron
  • Smile plot for resist thickness = 1.0 micron
  • Smile plot for resist thickness = 0.9 micron
  • ED tree for resist thickness = 0.9 micron
  • ED tree for resist thickness = 1.0 micron
  • Data from CD_3V
• Conclusion

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