Contents:

• Introduction
• Isolation processes in VLSI technology
• Main aspects of LOCOS Simulation
• ATHENA Oxidation models
• Examples of LOCOS structures
• Semirecessed and fully recessed LOCOS
• Polybuffered LOCOS initial and final structure
• Poly-buffered LOCOS
• Initial and final SILO structure
• Initial and final SWAMI structure
• Stresses in the SWAMI process
• Calibration of LOCOS effects using VWF
• RSM for normalized bird's beak length
• Regression model overlay
• Field oxide thinning effect
• Pad oxide punch-through effect
• Conclusion

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