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Mocasim
Monte Carlo Transport Parameter Generator
Mocasim is an ensemble Monte Carlo semiconductor transport parameter generator.
It calculates the electron transport properties of Diamond, Zincblende and Wurtzite
crystal semiconductors. The results can be used in FastBlaze for the accurate
simulation of MESFETs and HEMTs. Valid Semiconductors Mocasim simulates the conduction band using a non-parabolic three-valley model. Mocasim is ideal for simulating the transport properties of Diamond and Zincblende crystal semiconductors (such as Silicon and GaAs) which have a well known G, L, X conduction band structure. The conduction band of Wurtzite semiconductors (such as GaN) is more complex but can also be simulated by defining the properties of the three lowest valleys.
Input Parameters Mocasim requires the basic physical properties of the crystal: density, speed of sound, dielectric constant, optical phonon energy, deformation potential. A conduction band valley is described by an effective mass, non-parabolicity, degeneracy and its energy relative to the lowest valley. A maximum of three conduction band valleys can be defined. The parameters of several semiconductors are pre-defined (e.g. SiGe, GaAs, GaN, etc.) and Mocasim also supports user-defined materials.
Output Parameters Mocasim calculates velocity, energy and momentum relaxation time, kinetic and potential energy, effective mass and the fraction of electrons in each conduction band valley. These parameters are calculated as a function of electric field, doping and temperature.
![]() Initially the electrons are in a Boltzmann
distribution in the lowest conduction band valley. The equilibrium distribution
is attained by running the simulation for a “burn in” period.
Once the electrons are in their equilibrium distribution the results are
extracted by averaging over many time steps.
![]() Mocasim generates the scattering rates
for a variety of mechanisms allocated by the user. The figure above illustrates
the variation of the total and individual scattering rates in the G valley
of GaAs at 300K as a function of energy.
Scattering Mechanisms The electrons are scattered by imperfections in the crystal and by the thermal motion of the atoms. Any number of scattering mechanisms may be defined for simulation. Mocasim
has functions for the most common scattering events which occur in bulk semiconductors.
If other scattering mechanisms, such as alloy scattering or plasmon
scattering, are deemed important they can be defined by the user and included
through the Silvaco C-Interpreter.
![]() The electron velocity for GaAs at 300K is shown as
a function of net impurity density and electric field.
![]() The electron momentum relaxation time in Si at 300K
is shown as a function of doping at three different electric fields.
![]() The electron velocity in GaN at 300K is shown as a
function of electric field at doping of 1015, 1017,
1018, and 1019 cm-3.
![]() This figure shows the velocity, energy, energy relaxation
time and momentum relaxation time as a function of electric field and
doping for GaN at 300K. |
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