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Optolith:

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Optolith is a powerful non-planar 2D lithography simulator that models all aspects of modern deep sub-micron lithography: imaging, exposure, photoresist bake, development, and reflow. Optolith provides a fast and accurate alternative to experimental evaluation of mask printability and process control. Optolith simulates both projection imaging and proximity printing with large mask-to-resist gap.

Rev. 112807_07