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Elite is an advanced 2D topography simulator for modeling physical etching, deposition, reflow and CMP planarization processes for modern semiconductor technologies. Within the ATHENA framework, Elite provides seamless bi-directional integration with SSuprem4 and Optolith process simulators and contains an additional MC Deposit/Etch Simulator, which provides several Monte Carlo based atomistic etching and deposition models.

Rev. 122107_07