Advances in ion implantation modeling for doping of semiconductors
5.4mb

Backend Process Simulation including Plasma Etch
1.6mb

CMOS Latchup Simulation
1.1mb

Elite 2D Topography
Advanced 2D deposition and etch simulator
1.1mb

Fast Monte-Carlo Simulation of Ion Implantation
Binary collision approximation implementation within ATHENA
2.1mb

LOCOS modeling
Modeling of Local Oxidation Processes
1.2mb

MC Depo/Etch
2D Monte Carlo deposition and etch simulator
760kb

MC Implant 1D/2D Monte Carlo Implantation Simulator
Seamlessly integrated into ATHENA's SSuprem4
2.8mb

Modeling of implantation using analytical models
1.1mb

Optimization of photolithography process using simulation
1.1mb

Optolith 2D Lithography Simulator
Advanced 2D optical lithography simulator
2.7mb

PLS Advanced Diffusion Model
New advanced diffusion model for dopants in Silicon
1.2mb

Process Model Simulates Lithography, Plasma Etch
Sophisticated treatments for a surprising range of semiconductor processes

Process simulation calibration
676kb

RTA simulation using <311> cluster models
932kb

SSuprem4 Process Simulation Software
Advanced 2D Process Simulator
1mb