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ATHENA:

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Release Notes

ATHENA
Presentations

• Advances in ion implantation modeling for doping of semiconductors
  5.4mb
  
  
• Backend Process Simulation including Plasma Etch
  1.6mb
  
  
• CMOS Latchup Simulation
  1.1mb
  
  
• Elite 2D Topography
  Advanced 2D deposition and etch simulator
  1.1mb
  
  
• Fast Monte-Carlo Simulation of Ion Implantation
  Binary collision approximation implementation within ATHENA
  2.1mb
  
  
• LOCOS modeling
  Modeling of Local Oxidation Processes
  1.2mb
  
  
• MC Depo/Etch
  2D Monte Carlo deposition and etch simulator
  760kb
  
  
• MC Implant 1D/2D Monte Carlo Implantation Simulator Seamlessly integrated into ATHENA's SSuprem4
  2.8mb
  
  
• Modeling of implantation using analytical models
  1.1mb
  
  
• Optimization of photolithography process using simulation
  1.1mb
  
  
• Optolith 2D Lithography Simulator
  Advanced 2D optical lithography simulator
  2.7mb
  
  
• PLS Advanced Diffusion Model
  New advanced diffusion model for dopants in Silicon
  1.2mb
  
  
• Process Model Simulates Lithography, Plasma Etch
  Sophisticated treatments for a surprising range of semiconductor processes
  
  
• Process simulation calibration
  676kb
  
  
• RTA simulation using <311> cluster models
  932kb
  
  
• SSuprem4 Process Simulation Software
  Advanced 2D Process Simulator
  1mb
  

ATHENA framework integrates several process simulation modules within a user-friendly environment provided by Silvaco TCAD interactive tools. ATHENA has evolved from a world-renowned Stanford University simulator SUPREM-IV, with many new capabilities developed in collaboration with dozens of academic and industrial partners. ATHENA provides a convenient platform for simulating processes used in semiconductor industry: ion implantation, diffusion, oxidation, physical etching and deposition, lithography, stress formation and silicidation.

Rev. 112807_20