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ATHENA Presentations

Advances in ion implantation modeling for doping of semiconductors
ATHENA Advanced Process Simulation

Backend Process Simulation including Plasma Etch
CMOS Latchup Simulation
Elite 2D Topography Advanced 2D deposition and etch simulator

Fast Monte-Carlo Simulation of Ion Implantation Binary collision approximation implementation within ATHENA

LOCOS modeling Modeling of Local Oxidation Processes

MC Depo/Etch 2D Monte Carlo deposition and etch simulator

MC Implant 1D/2D Monte Carlo Implantation Simulator Seamlessly integrated into ATHENA's SSuprem4

Modeling of implantation using analytical models
Optimization of photolithography process using simulation
Optolith 2D Lithography Simulator Advanced 2D optical lithography simulator

PLS Advanced Diffusion Model New advanced diffusion model for dopants in Silicon

Process Model Simulates Lithography, Plasma Etch Sophisticated treatments for a surprising range of semiconductor processes

Process simulation calibration
RTA simulation using <311> cluster models
SSuprem4 Process Simulation Software Advanced 2D Process Simulator

ATHENA framework integrates several process simulation modules within a user-friendly environment provided by Silvaco TCAD interactive tools. ATHENA has evolved from a world-renowned Stanford University simulator SUPREM-IV, with many new capabilities developed in collaboration with dozens of academic and industrial partners. ATHENA provides a convenient platform for simulating processes used in semiconductor industry: ion implantation, diffusion, oxidation, physical etching and deposition, lithography, stress formation and silicidation.

Rev. 112807_20