Comparison of Analytical and MC Implant Models

aniiex13.in : Comparison of Analytical and MC Implant Models

Requires: SSuprem 4, MC IMPLANT
Minimum Versions: Athena 5.21.2.R

This example shows that the channeling effect of ion implantation can be simulated by using the Monte Carlo crystal model. It compares boron implants at 7 degrees obtained by amorphous and crystalline Monte Carlo models with amorphous and SVDP analytical models. Within the range of the SVDP model validity the analytical approach is preferred. However outside this range the crystalline MC implant can be used for more accurate profiles.

To load and run this example, select the Load example button. This action will copy all associated files to your current working directory. Select the DeckBuild run button to execute the example.