2D BCA coincident boron arsenic point implants

aniiex11.in : 2D BCA coincident boron arsenic point implants

Requires: SSuprem 4, MC IMPLANT
Minimum Versions: Athena 5.21.2.R

This example shows the difference between two implants as a result of the order in which they are done. The implant damage from the first implant affects the second implant.

An impenetrable barrier layer is deposited upon silicon in this example, which is then etched to create a 10 nm wide window. This structure forms the starting point for two separate cases.

In the first case, a 10 keV arsenic implant is performed, followed by a 10 keV boron implant. Arsenic, a heavier ion than boron, creates significant damage in the silicon. As a result, the crystal integrity of silicon is reduced, which in turn reduces the boron channeling.

The second case reverses the order of the implants (but maintains the same energy and dose). Boron is first implanted, and the normal [100] channel profile of boron as determined by BCA is formed. The arsenic implant follows. Since boron is much lighter than arsenic, there is less damage created by the boron implant (which can also be viewed in the .history.str files), and arsenic forms nearly the same distribution as in the first case. Quantitatively, the peak concentration (the projected range) of boron is noticeably deeper in the second case.

The current example simulates 10,000 ions incident upon the structure for each implant. Increased accuracy, at the cost of increased simulation time, can be obtained by increasing the n.ion parameter of the IMPLANT statement to 100,000.

The impct.point parameter specifies a precise impact location for the ions. This parameter makes the barrier layer redundant, and is available only for Monte Carlo ion implant simulations. See the Athena User's manual for a complete description

To load and run this example, select the Load example button. This action will copy all associated files to your current working directory. Select the DeckBuild run button to execute the example.