Boron Implant and Anneal

andfex01.in : Boron Implant and Anneal

Requires: SSuprem 4
Minimum Versions: Athena 5.21.2.R

This example gives a simple demonstration of implantation and annealing. Boron is implanted and the profile diffused. Because the implant is not masked, Athena/SSuprem 4 remains in 1D mode.

For this anneal of a medium dose implant in an inert ambient the default fermi diffusion model is used.

After completing the diffusion calculation, TonyPlot is used to plot a 1D cutline through the structure.

To load and run this example, select the Load example button. This action will copy all associated files to your current working directory. Select the DeckBuild run button to execute the example.