DevEdit Mesh Adaptation with Elite and SSuprem 4

anex08.in : DevEdit Mesh Adaptation with Elite and SSuprem 4

Requires: SSuprem 4, Elite, and DEVEDIT
Minimum Versions: Athena 5.21.2.R

This example shows the use of DevEdit in a mesh adaptation application. A trench is etched with an Elite etch machine. A highly doped oxide is then deposited inside the trench for sidewall doping. Boron segregation and transport coefficients are defined. (These parameters may be used to calibrate the amount of out diffusion of boron.)

A short heat cycle segregates out some of the boron from the oxide into the silicon trench sidewall.

DevEdit is then invoked to regrid the structure based upon the concentration gradient of the boron and phosphorous. The weight for each impurity will determine the distance from the diffusion front that the grid is refined. These parameters should be used in relation to the estimated subsequent diffusion profile.

DevEdit is invoked at a point where minimal material boundary points exist to minimize the mesh density. This is a preferred although not essential method of use.

Next, Athena is re-invoked and again the segregation and transport coefficients are defined in the new Athena session.

A second diffusion is started, and the boron diffusion front now moves within the refined mesh region.

DevEdit may be used in this manner to refine at any stage during a process flow.

To load and run this example, select the Load example button. This action will copy all associated files to your current working directory. Select the DeckBuild run button to execute the example.