Trench Oxidation

anex07.in : Trench Oxidation

Requires: SSuprem 4, Elite
Minimum Versions: Athena 5.21.2.R

This example shows the use of Elite to model a trench process using two different etch conditions. Following the trench formation, an oxide layer is grown. Note that "uneven" surfaces resulted from Elite etch don't prevent to simulate the oxidation process.

The final structures are then plotted using TonyPlot .

To load and run this example, select the Load example button. This action will copy all associated files to your current working directory. Select the DeckBuild run button to execute the example.