Stress Dependent Oxidation for Mesa Isolation Process

anoxex13.in : Stress Dependent Oxidation for Mesa Isolation Process

Requires: SSuprem 4
Minimum Versions: Athena 5.21.2.R

This example demonstrates effect of the stress dependent Visco-Elastic Oxidation model (see also example anoxex06.in) on oxidation in a deep trench etched in the SOI (buried oxide) subsrate. Oxidations in this example are performed with and without the stress dependence. The results of oxidation using the two models are plotted together using TonyPlot to compare the structures predicted by the two models.

To enable the stress dependent viscous model the syntax required is:
method viscous
oxide stress.dep=t

To load and run this example, select the Load example button. This action will copy all associated files to your current working directory. Select the DeckBuild run button to execute the example.